Gore Releases Super Filtering Accuracy Measurement Method

Gore Announces New Measurement Method for <50nm Particles in Ultrapure Water for the Semiconductor Industry Confirms Removal of Particles Down to 12nm in Eckerton, Maryland, USA, July 9, 2012 /PRNewswire-Asia/ ---W. L. Gore & Associates and CT Associates released a copy of a new measurement method to measure particles smaller than 50nm in the ultrapure water of the semiconductor industry and to minimize the combination of ultrafiltration (UF) and microfiltration (MF). Up to 12nm particles.

Gore(R) Filters What semiconductor manufacturers want to know is that their UPW system can produce water that does not contain tiny particles that can cause yield problems. When their line width is smaller, this strict particle size can be as small as 10 nm or less. Current particle counters cannot measure such tiny particles, but semiconductor manufacturers need to be aware that their UPW system's filtering strategy must be able to capture such tiny particles.

The particle detection technology that has been developed so far allows filter manufacturers to measure the filtration efficiency of such fine particles in a laboratory environment. This technique relies on an innovative method of vaporizing UPW into a gaseous mist. That is, the particles from the UPW are kept in the gas phase, so that they can accurately measure the size and number of the fine particles through the conventional gaseous particle detector.

This method is currently widely used to evaluate the filtration performance of ultrafiltration modules used in most UPW systems. The test showed that although these ultrafiltration modules have very high filtration accuracy, some very small particles can still pass through the ultrafiltration membrane, posing a risk to semiconductor manufacturers. The test method further shows that a microfiltration filter core with extremely high filtration accuracy can retain most of the microscopic particles. Finally, it was verified that a filter system using both an ultrafiltration module and a high-precision microfiltration filter showed excellent filtration performance for particles as small as 12 nm.

The latest *** "Ultrafiltration and microfiltration combined to remove 12nm particles in UPW" by CT Associates, Inc. Donald C Grant and Dennis Chilcote and W. L. Gore and Associates, Inc. Written by Uwe Beuscher, available online. Com The 5/6 issue of the ULTRAPURE WATER® Journal. It will also be demonstrated at the Ultra Pure Water-Micro Conference in Phoenix, Arizona on November 13-14. For specific information on the conference, please see: http://. Com/Conferences/Phoenix. HTM

W. L. Gore&Associates, Inc. Company Profile GORE PTFE membranes have been used in decades of experience in the world's best filters for the semiconductor, electronics, ultrapure water, and high purity chemical industries. For more than 30 years, Gore has created innovative, reliable PTFE membrane products that have helped many microelectronics manufacturers increase production efficiency, reduce equipment downtime and increase throughput. In the electronics, textile, industrial and medical markets, Gore has thousands of products manufactured using advanced technologies and is a global leader. In addition to the best-known waterproof breathable GORE-TEX® fabrics, the company's range of products includes a wide range of innovations, from guitar strings to life-saving cardiovascular devices. Headquartered in Newark, Delaware, Gore has approximately $3 billion in global sales, employs 9,000 people, and is located in 30 countries around the world. Since 1984, Fortune magazine's "100 Best Companies to Work For" list has been selected. Gore is one of only four companies to be selected each year.